Modern Ion Plating Technology: Fundamentals and Applications
Wang, Fuzhen
Wu, Junwei
Ion plating technology utilizes plasma energy to produce thinner and finer layers with various special functions for high-tech products. With the extensive application of ion plating in the modern world, this technology has seen rapid advances taking place in recent years. Ion Plating Technology: Fundamentals and Applications discusses the fundamental concepts of plasma physics in various coating technologies and explores its development and implementation into new technologies. Recent progress of technologies and products via ion plating will be introduced. The book begins with the treatment of vacuum physics, through plasma physics. It then presents the various forms of ion plating, before concluding with a section presenting examples of applications where ion plating is employed. Through the material presented in this book, the reader gains an understanding of the importance of ion plating technology to human progress and its various potential applications. Under the guidance of plasma physics knowledge, how to use electric and electromagnetic fields to control the space plasma will be critical to the development of new technology and systems. Presents both the principle and processes of various ion plating technology Introduces the fundamental physics of ion plating Includes the application of ion plating technology in high-tech products INDICE: 1. Introduction of Ion Plating Technology2. Fundamental of Vacuum Physics3. Fundamental of Plasma Physics4. Classification of Vacuum Plating Technology5. Vacuum Evaporation Plating6. Glow discharge Ion plating7. 7 Hot Arc Ion Plating8. Cathodic Arc Ion Plating9. Magnetron Sputtering Technology10. Plasma chemical vapor deposition (CVD)11. Function of Charged Particle Beams in Plating12. Application of Ion Plating
- ISBN: 978-0-323-90833-7
- Editorial: Elsevier
- Encuadernacion: Rústica
- Páginas: 504
- Fecha Publicación: 01/09/2022
- Nº Volúmenes: 1
- Idioma: Inglés