Porous silicon in practice: preparation, characterization and applications

Written by an outstanding, well-recognized expert in the field, this book introduces the electrochemical and synthetic methods, as well as characterizationtechniques and applications for porous silicon. It discusses the constructionand considerations involved with etch cells, and describes the three types ofporous silicon structures, films, three-dimensional structures, and nanoparticles. Separate chapters consider the measurement of infrared spectra, optical properties, pore size, porosity, thickness, and surface area. The whole is backed by a generous use of color photographs to illustrate the described procedures in detail, plus a bibliography of further literature pertinent to a wide range of application fields. INDICE: Preface FUNDAMENTALS OF POROUS SILICON PREPARATION Introduction Chemical Reactions Governing the Dissolution of Silicon Experimental Set-up and Terminology for Electrochemical Etching of Porous Silicon Electrochemical Reactions in the Silicon System Density, Porosity, and Pore Size Definitions Mechanisms of Electrochemical Dissolution and Pore Formation Resume of the Properties of Crystalline Silicon Choosing, Characterizing, and Preparing a Silicon Wafer PREPARATION OF MICRO-, MESO-, AND MACRO-POROUS SILICON LAYERS Etch Cell: Materials and Construction Power Supply Other Supplies Safety Precautions and Handling of Waste Preparing HF Electrolyte Solutions Cleaning Wafers Prior to Etching Preparation of Microporous Silicon from a p-Type Wafer Preparation of Mesoporous Silicon from a p++-Type Wafer Preparation of Macroporous, Luminescent Porous Silicon from an n-Type Wafer (Frontside Illumination) Preparation of Macroporous, Luminescent Porous Silicon from an n-Type Wafer (Back Side Illumination) Preparation of Porous Silicon by Stain Etching Preparation of Silicon Nanowire Arrays by Metal-Assisted Etching PREPARATION OF SPATIALLY MODULATED POROUS SILICON LAYERS Time-Programmable Current Source Pore Modulation in the z-Direction: Double Layer Pore Modulation in the z-Direction: Rugate Filter More Complicated Photonic Devices: Bragg Stacks, Microcavities, and Multi-Line Spectral Filters Lateral Pore Gradients (in the x-y Plane) Patterning in the x-yPlane Using Physical or Virtual Masks Other Patterning Methods FREESTANDING POROUS SILICON FILMS AND PARTICLES Freestanding Films of Porous Silicon-'Lift-offs' Micron-Scale Particles of Porous Silicon by Ultrasonication of Lift-off Films Core-Shell (Si/SiO2) Nanoparticles of Luminescent Porous Silicon by Ultrasonication CHARACTERIZATION OF POROUS SILICON Gravimetric Determination of Porosity and Thickness Electron Microscopy and Scanned Probe Imaging Methods Optical Reflectance Measurements Porosity, Pore Size, and Pore Size Distribution by Nitrogen Adsorption Analysis (BET, BJH, and BdB Methods) Measurement of Steady-State Photoluminescence Spectra Time-Resolved Photoluminescence Spectra Infrared Spectroscopy of Porous Silicon CHEMISTRY OF POROUS SILICON Oxide-FormingReactions of Porous Silicon Biological Implications of the Aqueous Chemistry of Porous Silicon Formation of Silicon-Carbon Bonds Thermal Carbonization Reactions Conjugation of Biomolecules to Modified Porous Silicon Chemical Modification in Tandem with Etching Metallization Reactions of Porous Silicon APPENDIXA1. ETCH CELL ENGINEERING DIAGRAMS AND SCHEMATICS Standard or Small Etch Cell-Complete Standard Etch Cell Top Piece Small Etch Cell Top Piece Etch Cell Base (for Either Standard or Small Etch Cell) Large Etch Cell-Complete Large EtchCell Top Piece Large Etch Cell Base APPENDIX A2. SAFETY PRECAUTIONS WHEN WORKING WITH HYDROFLUORIC ACID Hydrofluoric Acid Hazards First Aid Measures for HFContact Note to Physician HF Antidote

• ISBN: 978-3-527-31378-5
• Editorial: Wiley-VCH
• Encuadernacion: Rústica
• Páginas: 264
• Fecha Publicación: 19/10/2011
• Nº Volúmenes: 1
• Idioma: Inglés