Evolution of thin film morphology: modeling and simulations

Thin film deposition is the most ubiquitous and critical of the processes used to manufacture high tech devices. Morphology and microstructure of thin films directly controls their optical, magnetic, and electrical properties. This book focuses on modeling and simulations used in research on the morphological evolution during film growth. The authors emphasize the detailed mathematical formulation of the problem both through numerical calculations based on Langevin continuum equations, and through Monte Carlo simulations based on discrete surface growth models when an analytical formulism is not convenient. Evolution of Thin-Film Morphology will be of benefit to university researchers and industrial scientists working in the areas of semiconductor processing, optical coating, plasma etching, patterning, micro-machining, polishing, tribology, andany discipline that requires an understanding of thin film growth processes. Presents basic modeling and simulation tools for quantitative description of thin film morphological evolution. Displays clear conceptual developments in the fundamental understanding of complex surface growth phenomena. Provides a close connection between modeling and simulations and various practical deposition methodologies. Requires minimum mathematical and computer programming backgrounds to learn the subject. INDICE: Introduction.- Surface Statistics.- Self-Affine Surfaces.- MoundedSurfaces.- Stochastic Growth Equations.- Small World Growth Model: A Case Study.- Monte Carlo Simulations.- Drop-down Aggregation Models.- Ballistic Aggregation Models.- Conclusions.

• ISBN: 978-0-387-75108-5
• Editorial: Springer
• Encuadernacion: Cartoné
• Páginas: 204
• Fecha Publicación: 01/01/2008
• Nº Volúmenes: 1
• Idioma: Inglés