High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS with an emphasis on how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and resulting thin film characteristics. Ionization of sputtered atoms are discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission, and the importance of controlling the process gas dynamics, both inert as well as reactive gases, are examined in detail with the aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment, in order to establish general trends on how to optimize any given HiPIMS process. Experimental results and simulations, based on industrially relevant material systems, are used to illustrate mechanisms controlling nucleation kinetics, column formation, and microstructure evolution Includes a comprehensive description of the HiPIMS process from the fundamental physics to applicationsProvides a link, in terms of process understanding, between the process plasma community and the thin film communityDiscusses the industrialization of HiPIMS and its real world applications INDICE: 1. Introduction (particle surface interaction) 2. Power coupling 3. HiPIMS process characteristics 4. Reactive HiPIMS 5. HiPIMS modeling 6. Physics of HiPIMS 7. HiPIMS thin films 8. Industrialization of HiPIMS

• ISBN: 978-0-12-812454-3
• Editorial: Elsevier
• Encuadernacion: Rústica
• Páginas: 304
• Fecha Publicación: 01/11/2019
• Nº Volúmenes: 1
• Idioma: Inglés