Recent advances in techniques to characterise thin films in situ during deposition could lead to an improved understanding of deposition processes and to better, faster, diagnosis of issues with the deposition process. In-situ characterization of thin film growth provides a comprehensive review of this increasingly important topic. Part one reviews electron diffraction techniques, including the methodology for taking observations and measurements. Part two coversphotoemission techniques; the principles and instrumentation. Part three contains alternative in-situ characterisation techniques and the trend for combining different techniques. It covers real-time characterization of the nucleation, growth, structural and electronic properties of thin films. INDICE: Part 1 Electron diffraction techniques for studying thin film growth in situ: Reflection high-energy electron diffraction (RHEED) for in situ characterisation of thin film growth; Inelastic scattering techniques for in situ characterisation of thin film growth: backscatter Kikuchi diffraction. Part 2 Photoemission techniques for studying thin film growth in situ: Ultraviolet photoemission spectroscopy (UPS) for in situ characterisation of thin film growth; X-ray photoelectron spectroscopy (XPS) for in situ characterisation of thin film growth; In situ spectroscopic ellipsometry (SP) for characterization of thin film growth. Part 3 Alternative in situ characterization techniques: Insitu ion beam surface characterization of thin multicomponent films; Spectroscopies combined with (RHEED) for real time in situ surface monitoring of thin film growth; In situ deposition vapor monitoring; Real-time studies of epitaxial film growth using surface x-ray diffraction (SXRD).
- ISBN: 978-1-84569-934-5
- Editorial: Woodhead
- Encuadernacion: Cartoné
- Páginas: 296
- Fecha Publicación: 01/10/2011
- Nº Volúmenes: 1
- Idioma: Inglés