Developments in Surface Contamination and Cleaning, Vol. 1: Fundamentals and Applied Aspects

Developments in Surface Contamination and Cleaning, Vol. 1: Fundamentals and Applied Aspects, Second Edition, provides an excellent source of information on alternative cleaning techniques and methods for characterization of surface contamination and validation. Each volume in this series contains a particular topical focus, covering the key techniques and recent developments in the area. This volume forms the heart of the series, covering the fundamentals and application aspects, characterization of surface contaminants, and methods for removal of surface contamination. In addition, new cleaning techniques effective at smaller scales are considered and employed for removal where conventional cleaning techniques fail, along with new cleaning techniques for molecular contaminants. The Volume is edited by the leading experts in small particle surface contamination and cleaning, providing an invaluable reference for researchers and engineers in R&D, manufacturing, quality control, and procurement specification in a multitude of industries such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Provides best-practice guidance for scientists and engineers engaged in surface cleaning or those who handle the consequences of surface contaminationAddresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries as spearheaded by the semiconductor industryPresents state-of-the-art survey information on precision cleaning and characterization methods as written by a team of world-class experts in the field INDICE: Part 1 Fundamentals1. The Physical Nature of Very, Very Small Particles and its Impact on their Behaviour2. Transport and Deposition of Aerosol Particles3. Relevance of Particle Transport in Surface Deposition and Cleaning4. Particle Counting5. Aspects of Particle Adhesion and Removal6. Tribological Implications of Particles7. ESD Controls in Cleanroom Environments: Relevance to Particle Deposition8. Airborne Molecular Contamination: Contamination of Substrates and Environments in Semiconductors and Other IndustriesPart 2 Characterization9. Surface Analysis Methods for Contaminant Identification10. Electron Microscopy Techniques for Imaging and Analysis of Nanoparticles11. Wettability Techniques to Monitor the Cleanliness of SurfacesPart 3 Techniques for Removal of Surface Contamination12. Cleaning with Solvents13. Removal of Particles by Chemical Cleaning14. The Use of Surfactants to Enhance Particle Removal from Surfaces15. Microabrasive Precision Cleaning and Processing Technology16. Cleaning Using High-Speed Impinging Jet17. Carbon Dioxide Snow Cleaning18. Cleaning Using Argon/Nitrogen Cryogenic Aerosols19. Coatings for Preventing or Deactivation of Biological Contaminants20. A Detailed Study of Semiconductor Wafer Drying

• ISBN: 978-0-323-29960-2
• Editorial: William Andrew
• Encuadernacion: Cartoné
• Páginas: 1008
• Fecha Publicación: 09/11/2015
• Nº Volúmenes: 1
• Idioma: Inglés